dc.contributor.author | CROSS, GRAHAM | |
dc.contributor.author | O'CONNELL, BARRY SEAMUS | |
dc.contributor.author | PETHICA, JOHN BERNARD | |
dc.date.accessioned | 2009-03-10T15:36:56Z | |
dc.date.available | 2009-03-10T15:36:56Z | |
dc.date.issued | 2005 | |
dc.date.submitted | 2005 | en |
dc.identifier.citation | Graham L. W. Cross, Barry S. O'Connell, and John B. Pethica `Influence of elastic strains on the mask ratio in glassy polymer nanoimprint? in Applied Physics Letters, 86, (8), 2005, 081902 | en |
dc.identifier.other | Y | en |
dc.identifier.other | Y | |
dc.identifier.uri | http://hdl.handle.net/2262/28106 | |
dc.description | PUBLISHED | en |
dc.description.abstract | During glassy polymer nanoimprint, a supported film is extruded from protruding spunchd to
recessed scavityd regions of a patterned stamp. The completeness of this extrusion determines the
mask ratio for lithographic applications. We show that, for a given punch contact size, there is a
residual layer of unextruded material with a mean thickness that is independent of initial film
thickness, stamping time, or applied maximum load. Depth sensing indentation enables us to
monitor deformation during the imprinting as well as after, and so understand the deformation
process involved. It is found that both the geometry and mean thickness of the residual layer are
influenced by the overall elastic properties of the stamping system. | en |
dc.format.extent | 81902 | en |
dc.format.extent | 620298 bytes | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en | en |
dc.publisher | American Institute of Physics | en |
dc.relation.ispartofseries | Applied Physics Letters | en |
dc.relation.ispartofseries | 86 | en |
dc.relation.ispartofseries | 8 | en |
dc.rights | Y | en |
dc.subject | polymer films | en |
dc.subject | nanolithography | en |
dc.subject | soft lithography | en |
dc.subject | masks | en |
dc.subject | indentation | en |
dc.subject | internal stresses | en |
dc.subject | elasticity | en |
dc.subject | plastic deformation | en |
dc.title | Influence of elastic strains on the mask ratio in glassy polymer nanoimprint | en |
dc.type | Journal Article | en |
dc.type.supercollection | scholarly_publications | en |
dc.type.supercollection | refereed_publications | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/crossg | |
dc.identifier.rssuri | http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=APPLAB000086000008081902000001&idtype=cvips&prog=normal | |
dc.contributor.sponsor | Science Foundation Ireland | |