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dc.contributor.authorCaffrey, Daviden
dc.contributor.authorDuesberg, Georgen
dc.contributor.authorShvets, Igoren
dc.date.accessioned2020-01-14T16:36:59Z
dc.date.available2020-01-14T16:36:59Z
dc.date.issued2020en
dc.date.submitted2020en
dc.identifier.citationShvets P.V., Caffrey D., Fleischer K., Shvets I., O'Neill K., Duesberg G.S., Vinichenko A.N., Yu. Maksimova K., Yu. Goikhman A., Suppression of the metal-insulator transition in magnetron sputtered Ti2O3 films, Thin Solid Films, 694, 2020en
dc.identifier.issn00406090en
dc.identifier.otherYen
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0040609019306698?via%3Dihub
dc.identifier.urihttp://hdl.handle.net/2262/91314
dc.descriptionPUBLISHEDen
dc.description.abstractWe report on the synthesis of titanium suboxide films using a magnetron sputtering setup. The structure of the produced films is characterized using Raman spectroscopy and X-ray diffraction and electrical properties are measured by four-probe method. We demonstrate that depending on the oxidation rate of the growing films it is possible to produce polycrystalline α- TiO, corundum and orthorhombic Ti2O3 or almost amorphous TiO2. We focus on the characterization of the two phases of Ti2O3 and show that their structure and electrical properties significantly differ from earlier results obtained for bulk crystals or epitaxial films. Our corundum-type Ti2O3 films have high electrical conductivity (compared to the bulk) and no metal-insulator phase transition: the material is locked in the metallic state. The conductivity of our orthorhombic Ti2O3 is lower compared to epitaxial films; this phase does not demonstrate any phase transitions as well.en
dc.language.isoenen
dc.relation.ispartofseriesThin Solid Filmsen
dc.relation.ispartofseries694en
dc.rightsYen
dc.subjectTitanium suboxidesen
dc.subjectTi203en
dc.subjectMagnetron sputteringen
dc.subjectThin filmsen
dc.subjectRaman scatteringen
dc.subjectTiOen
dc.subjectMetal-insulator phase transitionsen
dc.titleSuppression of the metal-insulator transition in magnetron sputtered Ti2O3 filmsen
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/caffredaen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/duesbergen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/ivchvetsen
dc.identifier.rssinternalid209970en
dc.identifier.doihttp://dx.doi.org/10.1016/j.tsf.2019.137642en
dc.rights.ecaccessrightsopenAccess
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.contributor.sponsorGrantNumberSFI/12/RC/2278en
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.contributor.sponsorGrantNumber15/ IA/3131en
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.contributor.sponsorGrantNumber12/IA/1264en


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